The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2014

Filed:

Dec. 27, 2008
Applicants:

Hyung Sup Lee, Gyeonggi-do, KR;

Sung Tae Nam Goong, Gyeonggi-Do, KR;

Kyoo Hwan Lee, Gyeonggi-Do, KR;

Young Ho Kwon, Gyeonggi-Do, KR;

Chang Jae Lee, Gyeonggi-Do, KR;

Inventors:

Hyung Sup Lee, Gyeonggi-do, KR;

Sung Tae Nam Goong, Gyeonggi-Do, KR;

Kyoo Hwan Lee, Gyeonggi-Do, KR;

Young Ho Kwon, Gyeonggi-Do, KR;

Chang Jae Lee, Gyeonggi-Do, KR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); B05B 1/24 (2006.01); B05B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are a gas injector and a film deposition apparatus having the same. The gas injector includes a body, a supply hole, an injection hole, and a distribution plate. The body is configured to provide an inner space therein. The supply hole is formed in an upper surface of the body to communicate with the inner space and receive a raw material. The injection hole is formed in a lower surface of the body to communicate with the inner space and inject the raw material. The distribution plate is disposed in the inner space of the body. A through hole is formed in the distribution plate. The distribution plate is disposed to be inclined at a predetermined angle with respect to a horizontal plane. The gas injector can uniformly inject the raw material and improve vaporization efficiency of the raw material having a powder form.


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