The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2014

Filed:

Jul. 11, 2012
Applicants:

Kevin W. Mccullen, EssexJunction, VT (US);

Matthew T. Guzowski, Essex Junction, VT (US);

Rani Narayan, San Jose, CA (US);

Xiaoping Tang, Mohegan Lake, NY (US);

Xin Yuan, Roseville, CA (US);

Inventors:

Kevin W. McCullen, EssexJunction, VT (US);

Matthew T. Guzowski, Essex Junction, VT (US);

Rani Narayan, San Jose, CA (US);

Xiaoping Tang, Mohegan Lake, NY (US);

Xin Yuan, Roseville, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

Approaches are provided for fixing pin mismatches from swapping library cells in layout migration. Specifically, a method is provided that includes collecting information about a first technology pin from a library cell in a first technology. The method further includes swapping the library cell in the first technology with a library cell in a second technology. The method further includes collecting information about a second technology pin from the library cell in the second technology. The method further includes building a pin-mapping table that is configured to map the first technology pin to the second technology pin. The method further includes scaling a layout from the first technology to the second technology. The method further includes modifying the layout based on the pin-mapping table to match the at least one first technology pin to the at least one second technology pin while satisfying ground rules of the second technology.


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