The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2014

Filed:

Mar. 15, 2012
Applicants:

Chih-kung Lee, Taipei, TW;

Chih-jen Chien, Taipei, TW;

Yu-hsun Lee, Taipei, TW;

Chun-yen Chen, Taipei, TW;

Yuh-yan Yu, Taipei, TW;

Te-hsun Chen, Taipei, TW;

Inventors:

Chih-Kung Lee, Taipei, TW;

Chih-Jen Chien, Taipei, TW;

Yu-Hsun Lee, Taipei, TW;

Chun-Yen Chen, Taipei, TW;

Yuh-Yan Yu, Taipei, TW;

Te-Hsun Chen, Taipei, TW;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/00 (2006.01); G02B 6/26 (2006.01); G02B 6/42 (2006.01); F21V 7/04 (2006.01); G02B 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is an optical head, including a hollow micro-pipe and a stuffing member, the micro-pipe having a diameter-extended portion and a diameter-diminishing portion adapted allowing the incident light to transmit from the diameter-extended portion to the diameter-diminishing portion to emerge from its tip, and the stuffing member being disposed inside of the micro-pipe compared to prior techniques. The optical head of the invention is easier to be made, and it has a better focus for achieving optical exposure of sub-wave length focal spot and deep depth of focus.


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