The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Mar. 18, 2010
Katsunori Kawano, Kanagawa, JP;
Jiro Minabe, Kanagawa, JP;
Katsunori Kawano, Kanagawa, JP;
Jiro Minabe, Kanagawa, JP;
Fuji Xerox Co., Ltd., Tokyo, JP;
Abstract
An exposure apparatus includes a substrate in which plural light-emitting devices are arrayed one-dimensionally or two-dimensionally; and a hologram recording layer that is disposed on the substrate, plural holograms being recorded in the hologram recording layer by holographic interference between a first beam and a second beam such that a predetermined number of beam spots are disposed in the hologram recording layer in a predetermined array direction according to a portion of light-emitting devices, the portion of light-emitting devices being selected as emitters from the plural light-emitting devices, the beam spot being formed by a light beam of the second beam, the first beam passing through an optical path of diffusion light that passes through the emitter, the second beam passing through an optical path of convergent light that converges at a predetermined distance outside the optical path of the first beam.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile