The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Jul. 19, 2011
Hyung-rae Lee, Hwaseong-si, KR;
Yool Kang, Yongin-si, KR;
Kyung-hwan Yoon, Yongin-si, KR;
Hyoung-hee Kim, Hwaseong-si, KR;
So-ra Han, Bucheon-si, KR;
Tae-hoi Park, Hwaseong-si, KR;
Hyung-rae Lee, Hwaseong-si, KR;
Yool Kang, Yongin-si, KR;
Kyung-hwan Yoon, Yongin-si, KR;
Hyoung-hee Kim, Hwaseong-si, KR;
So-ra Han, Bucheon-si, KR;
Tae-hoi Park, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method of manufacturing a semiconductor device includes forming a resist pattern on a first region on a substrate, bringing a descum solution including an acid source into contact with the resist pattern and with a second region of the substrate, decomposing resist residues remaining on the second region of the substrate by using acid obtained from the acid source in the descum solution and removing the decomposed resist residues and the descum solution from the substrate.