The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Feb. 25, 2009
Gary Ganghui Teng, Northborough, MA (US);
Gary Ganghui Teng, Northborough, MA (US);
Other;
Abstract
A method for applying a light-blocking material onto an imagewise exposed lithographic printing plate is disclosed. The exposed plate comprises on a substrate a photosensitive layer having hardened areas and non-hardened areas (for negative plate) or solubilized areas and non-solubilized areas (for positive plate). The non-hardened or solubilized areas of said photosensitive layer are removable with ink and/or fountain solution on a lithographic press. The light-blocking material is applied to the plate preferably from a solution or dispersion containing such material. The application of the light-blocking material prevents at least a portion of the room light in a certain wavelength (such as ultraviolet) range from reaching the photosensitive layer, thus allowing improved room light stability of the exposed plate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile