The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Oct. 03, 2006
Applicants:
Terrence S. Mcgrath, Longmont, CO (US);
Deidre Sewell, Fort Collins, CO (US);
Daniel M. Storey, Longmont, CO (US);
Inventors:
Terrence S. McGrath, Longmont, CO (US);
Deidre Sewell, Fort Collins, CO (US);
Daniel M. Storey, Longmont, CO (US);
Assignee:
Metascape LLC, Maple Grove, MN (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61L 33/00 (2006.01); A61F 2/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.