The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Dec. 30, 2011
Yuriko Kaida, Tokyo, JP;
Hiroshi Sakamoto, Tokyo, JP;
Yuriko Kaida, Tokyo, JP;
Hiroshi Sakamoto, Tokyo, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
Processes for producing an article having a fine concavo-convex structure on the surface of a transparent substrate and a wire-grid polarizer, with high quality with high productivity, with which a concavo-convex layer having a large area can easily be achieved. The process comprises a step (I) of forming an interlayer (A) on the surface of a substrate film, a step (II) of forming a concavo-convex layer (B) having a fine concavo-convex structure on its surface, on the surface of the interlayer (A) by imprinting technology, and a step (IV) of separating a laminate comprising the interlayer (A) and the concavo-convex layer (B) from the substrate film and laminating the laminate to the surface of a transparent substrate so that the interlayer (A) faces the transparent substrate side. Further, a process for producing a wire-grid polarizer employing the production process.