The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Mar. 14, 2011
Hugh F. Smisson, Iii, Macon, GA (US);
David C. Field, Snellville, GA (US);
Brandi L. Bohleber, Macon, GA (US);
Hiywot Yilma, Atlanta, GA (US);
Michael A. Cowan, Charlotte, NC (US);
Hugh F. Smisson, III, Macon, GA (US);
David C. Field, Snellville, GA (US);
Brandi L. Bohleber, Macon, GA (US);
Hiywot Yilma, Atlanta, GA (US);
Michael A. Cowan, Charlotte, NC (US);
Southern Spine, LLC, Macon, GA (US);
Abstract
Various embodiments described herein provide devices and associated methods for treating spinal disease by implanting one or more interspinous process spacing devices. In one embodiment, an interspinous process spacing device includes a first attachment side and a second attachment side, whereby each attachment side includes one or more slots formed in the outer surface and oriented proximate one end for receiving fasteners extending inwardly from a second interspinous process spacing device. The device further includes a spacer tray positioned between the first attachment side and the second attachment side, the spacer tray extending from the first attachment side and slideably insertable through a tray slot formed in the second attachment side, wherein the spacer tray is adapted to retain adjacent spinous processes in a spaced apart orientation. The device further includes securing means for securing the second attachment side relative to the first attachment side, wherein, upon securing the second attachment side relative to the first attachment side, the interspinous process spacing device is engaged with the adjacent spinous processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile