The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2013

Filed:

Sep. 28, 2007
Applicants:

Huan Wang, Hong Kong, CN;

Ka Ming NG, Hong Kong, CN;

Xijun HU, Hong Kong, CN;

Jiyun Feng, Hong Kong, CN;

Inventors:

Huan Wang, Hong Kong, CN;

Ka Ming Ng, Hong Kong, CN;

Xijun Hu, Hong Kong, CN;

Jiyun Feng, Hong Kong, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/26 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

Aligned multi-walled carbon nanotubes were grown on both sides of a metallic or metal-coated substrate by water vapor-assisted chemical vapor deposition. Aligned carbon nanotube films of thickness ranging from 1 μm to over 100 μm were obtained. By manipulating various operating factors—position of substrate in the reactor, amount of water vapor, amount of catalyst, reactor temperature, and growth time, the morphology and thickness of these carbon nanotube films could be adjusted.


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