The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2013

Filed:

Dec. 03, 2009
Applicants:

David Chiche, Lyons, FR;

Nicolas Boudet, Chaponost, FR;

Jean Christophe Viguie, Lyons, FR;

Marc Antoine Lelias, Ales, FR;

Olivier Ducreux, Louveciennes, FR;

Inventors:

David Chiche, Lyons, FR;

Nicolas Boudet, Chaponost, FR;

Jean Christophe Viguie, Lyons, FR;

Marc Antoine Lelias, Ales, FR;

Olivier Ducreux, Louveciennes, FR;

Assignee:

IFP Energies nouvelles, Rueil-Malmaison Cedex, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01C 3/00 (2006.01); C07C 27/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a process for finally removing sulphur-containing, nitrogen-containing and halogen-containing impurities contained in a synthesis gas, said process including: The synthesis gas purified in accordance with the process of the invention contains less than 10 ppb by weight, less than 10 ppb by weight of nitrogen-containing impurities and less than 10 ppb by weight of halogen-containing impurities.


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