The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
May. 13, 2011
Tadashi Inaba, Haibara-gun, JP;
Kazutaka Takahashi, Haibara-gun, JP;
Tomonori Takahashi, Haibara-gun, JP;
Atsushi Mizutani, Haibara-gun, JP;
Tadashi Inaba, Haibara-gun, JP;
Kazutaka Takahashi, Haibara-gun, JP;
Tomonori Takahashi, Haibara-gun, JP;
Atsushi Mizutani, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are a cleaning composition which is capable of inhibiting the metal of a semiconductor substrate from corrosion, and has an excellent removability of plasma etching residues and/or ashing residues on the semiconductor substrate, a method for producing a semiconductor device, and a cleaning method using the cleaning composition. The cleaning composition for removing plasma etching residues and/or ashing residues formed on a semiconductor substrate, and a preparation method and a cleaning method for a semiconductor device, using the cleaning composition, wherein the cleaning composition includes (Component a) water; (Component b) an amine compound; (Component c) hydroxylamine and/or a salt thereof; (Component d) a quaternary ammonium compound; (Component e) an organic acid; and (Component f) a water-soluble organic solvent; and has a pH of 6 to 9.