The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Sep. 06, 2006
Applicants:
Toshihiro Kanematsu, Kanagawa, JP;
Katsunori Suto, Kanagawa, JP;
Tomohiro Harada, Kanagawa, JP;
Inventors:
Assignee:
Ricoh Company, Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 44/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of manufacturing a cell array structure includes a first step of laminating a deformable layer capable of causing plastic deformation on a substrate, the substrate being formed with plural, mutually separated depressions on a top surface thereof, such that the deformable layer forms a mutually isolated space in each of the plural depressions; and a second step of extending the space in each of the plural depressions by causing plastic deformation in the deformable layer, such that there are formed plural columnar cells respectively in correspondence to the plural depressions.