The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Feb. 27, 2006
Kazuyuki Kasumi, Utsunomiya, JP;
Hirohisa Ota, Kawagoe, JP;
Eigo Kawakami, Utsunomiya, JP;
Takashi Nakamura, Tokyo, JP;
Toshinobu Tokita, Yokohama, JP;
Kazuyuki Kasumi, Utsunomiya, JP;
Hirohisa Ota, Kawagoe, JP;
Eigo Kawakami, Utsunomiya, JP;
Takashi Nakamura, Tokyo, JP;
Toshinobu Tokita, Yokohama, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area.