The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2013

Filed:

Mar. 12, 2011
Applicants:

Shou-cheng Weng, Changhua County, TW;

Huai-an LI, Taoyuan County, TW;

Inventors:

Shou-Cheng Weng, Changhua County, TW;

Huai-An Li, Taoyuan County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
Abstract

A vertical transistor structure includes a substrate, a source, a first gate, a first insulating layer, a second gate, a gate insulating layer, a drain, a second insulating layer, and a semiconductor channel layer. The source is configured on the substrate. The first gate is configured on the source and has at least one first through hole. The first insulating layer is between the first gate and the source. The second gate is configured on the first gate and has at least one second through hole. The gate insulating layer is between the first and second gates and has at least one third through hole. The first, second, and third through holes are communicated with one another. The drain is configured on the second gate. The second insulating layer is configured between the second gate and the drain. The semiconductor channel layer fills the first, second, and third through holes.


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