The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2013
Filed:
Aug. 22, 2012
Gaku Sudo, Kanagawa-ken, JP;
Gaku Sudo, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to one embodiment, a manufacturing method of a semiconductor device includes forming a lower mask film on a semiconductor substrate. The method includes forming a barrier film in a first area. The method includes forming an upper mask film. The method includes removing an upper mask member and leaving a lower mask member in the first area and removing the upper mask member and the lower mask member in the second area. The removing is performed by etching in a condition in which an etching rate of the upper mask member and an etching rate of the lower mask member are higher than that of the barrier member. The method includes forming a conductive film. The method includes selectively removing the conductive film by performing etching in a condition in which an etching rate of the conductive film is higher than that of the lower mask member.