The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Oct. 29, 2008
Ichiro Kataoka, Kudamatsu, JP;
Ichiro Nishigaki, Ishioka, JP;
Yoshimitsu Hiro, Yokohama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
An analysis model generation system, for generating an analysis model of an analysis target, by correcting a distortion configuration owned by a configuration mesh data, which is generated by changing configuration of the analysis target, being made up with hexahedrons, into meshes, comprises a mesh data read-in portionfor reading the configuration mesh data therein, a mesh quality estimate portionfor estimating quality of a mesh of the configuration mesh data, a first databasefor classifying distortion configuration of the mesh into a pattern, so as to register it therein as a distorted mesh pattern, in advance, a mesh pattern determination portionfor determining, on which one of the distorted mesh patterns a distortion corresponds, when the mesh has the distortion as a result of the quality estimation within the mesh quality estimation portion, a second databasefor registering therein correction methods for correcting the distortion, corresponding to the distorted mesh pattern registered in the first database, a mesh correcting portionfor correcting the distortion of the mesh upon basis of the correction method, and a mesh data display portionfor displaying a result of conducting the correction.