The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Dec. 17, 2008
Applicants:
Beilei Xu, Penfield, NY (US);
Robert P. Loce, Webster, NY (US);
Jess R. Gentner, Rochester, NY (US);
Inventors:
Beilei Xu, Penfield, NY (US);
Robert P. Loce, Webster, NY (US);
Jess R. Gentner, Rochester, NY (US);
Assignee:
Xerox Corporation, Norwalk, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 15/02 (2006.01); H04N 1/04 (2006.01); G06T 5/00 (2006.01); G06K 9/40 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of achieving process-direction sub-raster magnification adjustment using non-redundant overwriting. The raster imager provides overwriting while the image path provides non-redundant data for each pass according to the desired magnification adjustment. The same laser power level can be used for the multiple writes, or optionally, it may be varied to further improve spatial resolution of the adjustment.