The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Jun. 24, 2011
Applicants:
Dae-hee Lee, Daejeon, KR;
Sin-young Kim, Daejeon, KR;
Moon-soo Park, Daejeon, KR;
Inventors:
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02F 1/1337 (2006.01);
U.S. Cl.
CPC ...
Abstract
A patterned retardation film includes: a substrate; a first alignment film and a second alignment film disposed on the substrate, processed by different alignment processes and having different alignment directions; and a liquid crystal layer disposed on the first alignment film and the second alignment film, wherein the liquid crystal layer is patterned into a first region, which is aligned by the first alignment film, and a second region, which is aligned by the second alignment film.