The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
May. 31, 2011
LU Gao, San Jose, CA (US);
Adam Douglas Greengard, Broomfield, CO (US);
Lu Gao, San Jose, CA (US);
Adam Douglas Greengard, Broomfield, CO (US);
OmniVision Technologies, Inc., Santa Clara, CA (US);
Abstract
An optical system for generating an image having extended depth of field. The system includes a phase mask and a chromatic wavefront coding lens. The chromatic wavefront coding lens provides axial color separation of light by generating specified chromatic aberration in an image created by the lens. The phase mask causes the optical transfer function of the optical system to remain substantially constant within a specified range away from the image plane, and the optical transfer function of the system contains no zeroes within at least one spectral passband of interest. Digital processing may be performed on the image to generate a final image by reversing a decrease in modulation transfer function generated by the phase mask.