The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2013

Filed:

Sep. 19, 2008
Applicants:

Frank A. Baiocchi, Allentown, PA (US);

James T. Cargo, Bethlehem, PA (US);

John M. Delucca, Wayne, PA (US);

Barry J. Dutt, Pen Argyl, PA (US);

Charles Martin, Windgap, PA (US);

Inventors:

Frank A. Baiocchi, Allentown, PA (US);

James T. Cargo, Bethlehem, PA (US);

John M. DeLucca, Wayne, PA (US);

Barry J. Dutt, Pen Argyl, PA (US);

Charles Martin, Windgap, PA (US);

Assignee:

Agere Systems LLC, Wilmington, DE (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 33/16 (2010.01);
U.S. Cl.
CPC ...
Abstract

An electronic device includes a semiconductor substrate and a dielectric layer over the substrate. A resistive link located over the substrate includes a first resistive region and a second resistive region. The first resistive region has a first resistivity and a first morphology. The second resistive region has a second resistivity and a different second morphology.


Find Patent Forward Citations

Baiocchi, Frank. (2013). Allotropic or morphologic change in silicon induced by electromagnetic radiation for resistance turning of integrated circuits (U.S. Patent No. 8610215). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8610215

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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