The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Sep. 28, 2011
Qun Sun, Wilmington, DE (US);
Gary L. Kiser, Newark, DE (US);
Robert D. Orlandi, Landenberg, PA (US);
Qun Sun, Wilmington, DE (US);
Gary L. Kiser, Newark, DE (US);
Robert D. Orlandi, Landenberg, PA (US);
Invista North America S.A R.L., Wilmington, DE (US);
Abstract
The present invention provides a highly efficient process for manufacturing copolyether glycol having a mean molecular weight of from about 650 to about 5000 dalton by polymerization of tetrahydrofuran and at least one alkylene oxide in the presence of an acid catalyst and at least one compound containing reactive hydrogen atoms. More particularly, the invention relates to a process for manufacturing copolyether glycol which comprises recycle to the polymerization reaction step of at least a portion of the oligomeric cyclic ether which is co-produced with the copolyether glycol, said process exhibiting an Space Time Yield value of greater than about 0.9.