The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Feb. 07, 2011
Aurélien Vantomme, Bois-de-Villers, BE;
Daniel Siraux, Naast, BE;
Alain Van Sinoy, Chastre, BE;
Jean-léon Gielens, Seneffe, BE;
Aurélien Vantomme, Bois-de-Villers, BE;
Daniel Siraux, Naast, BE;
Alain Van Sinoy, Chastre, BE;
Jean-Léon Gielens, Seneffe, BE;
Total Research & Technology Feluy, Seneffe (Feluy), BE;
Abstract
The invention relates to A process for the polymerization of ethylene to produce a polyethylene resin in at least two slurry loop reactors connected to each other in series, the resin having a bimodal molecular weight distribution, a molecular weight distribution MWD of at least 7.0, an HLMI of from 1 to 100 g/10 min, and a density of from 0.935 to 0.960 g/cm, wherein in one reactor 30 to 47 wt % based on the total weight of the polyethylene resin of a high molecular weight (HMW) polyethylene fraction is produced having an HL275 of from 0.05 to 1.8 g/10 min (the equivalent of HLMI of from 0.01 to 1.56 g/10 min), a density of from 0.925 to 0.942 g/cmand an MWD of at least 5.0, and in the other reactor a low molecular weight (LMW) polyethylene fraction is produced having an HLMI of from 10 to 1500 g/10 min and a density of from 0.960 to 0.975 g/cm, in the presence of a Ziegler-Natta catalyst system.