The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2013

Filed:

Mar. 15, 2010
Applicants:

Hiroyoshi Shouji, Miyagi, JP;

Shunichi Sato, Miyagi, JP;

Akihiro Itoh, Miyagi, JP;

Kazuhiro Harasaka, Miyagi, JP;

Inventors:

Hiroyoshi Shouji, Miyagi, JP;

Shunichi Sato, Miyagi, JP;

Akihiro Itoh, Miyagi, JP;

Kazuhiro Harasaka, Miyagi, JP;

Assignee:

Ricoh Company, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 27/15 (2006.01); H01L 29/22 (2006.01); H01L 33/00 (2010.01);
U.S. Cl.
CPC ...
Abstract

A disclosed method of manufacturing a surface emitting laser includes laminating a transparent dielectric layer on an upper surface of a laminated body; forming a first resist pattern on an upper surface of the dielectric layer, the first resist pattern including a pattern defining an outer perimeter of a mesa structure and a pattern protecting a region corresponding to one of the relatively high reflection rate part and the relatively low reflection rate part included in an emitting region; etching the dielectric layer by using the first resist pattern as an etching mask; and forming a second resist pattern protecting a region corresponding to an entire emitting region. These steps are performed before the mesa structure is formed.


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