The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2013

Filed:

Mar. 10, 2009
Applicants:

Hoi-lim Kim, Seoul, KR;

Hyun-ku Ahn, Hwaseongi-si, KR;

Jun-woo Lee, Anyang-si, KR;

Sung-yi Kim, Gwangju-si, KR;

Inventors:

Hoi-Lim Kim, Seoul, KR;

Hyun-Ku Ahn, Hwaseongi-si, KR;

Jun-Woo Lee, Anyang-si, KR;

Sung-Yi Kim, Gwangju-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 19/56 (2006.01);
U.S. Cl.
CPC ...
Abstract

A photo alignment material includes a photo alignment polymer and an organic solvent. The photo alignment polymer is prepared by polymerizing a diamine monomer including at least two photo reactive parts represented by the following Chemical Formula 1. In Chemical Formula 1, Rrepresents —(CH)—, —O(CH)— or R, Rand Reach independently represent —H, —O(CH)—CHor and n and m independently represent an integer of from 1 to 8. Thus, change of the orientation of the alignment layer due to the action of an electric stress may be prevented and/or reduced. Therefore, an after—image may be reduced, and display quality is improved.


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