The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Jan. 18, 2010
Applicants:
Deepak Varshney, San Juan, PR (US);
Gerardo Morell, Guaynabo, PR (US);
Brad R. Weiner, Dorado, PR (US);
Vladimir Makarov, San Juan, PR (US);
Inventors:
Deepak Varshney, San Juan, PR (US);
Gerardo Morell, Guaynabo, PR (US);
Brad R. Weiner, Dorado, PR (US);
Vladimir Makarov, San Juan, PR (US);
Assignee:
The University of Puerto Rico, San Juan, PR (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C30B 29/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
Diamond thin films were deposited on copper substrate by the Vapor Solid (VS) deposition method using a mixture of fullerene Cand graphite as the source material. The deposition took place only when the substrate was kept in a narrow temperature range of approximately 550-650° C. Temperatures below and above this range results in the deposition of fullerenes and other carbon compounds, respectively.