The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Jun. 27, 2011
Surendra Singh, Chandler, AZ (US);
Andy Szuromi, Phoenix, AZ (US);
Vladimir K. Tolpygo, Scottsdale, AZ (US);
Andy Kinney, Chandler, AZ (US);
Surendra Singh, Chandler, AZ (US);
Andy Szuromi, Phoenix, AZ (US);
Vladimir K. Tolpygo, Scottsdale, AZ (US);
Andy Kinney, Chandler, AZ (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
Embodiments of methods and systems for inspecting a structure for a crystallographic imperfection are provided. In the method, an X-ray wavelength that is particularly susceptible to diffraction by the crystallographic imperfection is identified. Then an X-ray source is provided to emit X-rays in the identified X-ray wavelength. While placing the structure at a sequence of positions relative to the X-ray source, X-rays are directed at the structure in multiple, non-parallel arrays to create sequential patterns of diffracted X-rays. The patterns of diffracted X-rays are digitally captured and communicated to a computer that compares them to locate the crystallographic imperfection. For a surface imperfection, the imperfection may be marked with a target to allow for physical removal.