The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Nov. 05, 2008
Katsutoshi Morinaka, Minato-ku, JP;
Yoshikazu Arai, Minato-ku, JP;
Hiroshi Uchida, Minato-ku, JP;
Toshio Fujita, Minato-ku, JP;
Katsutoshi Morinaka, Minato-ku, JP;
Yoshikazu Arai, Minato-ku, JP;
Hiroshi Uchida, Minato-ku, JP;
Toshio Fujita, Minato-ku, JP;
Showa Denko K.K., Tokyo, JP;
Abstract
The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.