The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Jun. 18, 2013
Applicant:
Masanobu Hayashi, Kakegawa, JP;
Inventor:
Masanobu Hayashi, Kakegawa, JP;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/47 (2006.01); H01L 21/471 (2006.01); H01L 21/312 (2006.01); H01L 21/314 (2006.01); H01L 21/3105 (2006.01); H01L 21/469 (2006.01); B05D 3/02 (2006.01); H01L 21/56 (2006.01); C01B 15/01 (2006.01);
U.S. Cl.
CPC ...
Abstract
This invention relates to a dipping solution used in a process for producing a siliceous film. The present invention provides a dipping solution and a siliceous film-production process employing the solution. The dipping solution enables to form a homogeneous siliceous film even in concave portions of a substrate having concave portions and convex portions. The substrate is coated with a polysilazane composition, and then dipped in the solution before fire. The dipping solution comprises hydrogen peroxide, a foam-deposit inhibitor, and a solvent.