The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2013

Filed:

Apr. 04, 2012
Applicants:

Bong-kyun Kim, Hwaseong-si, KR;

Shin-il Choi, Hwaseong-si, KR;

Hong-sick Park, Suwon-si, KR;

Wang-woo Lee, Suwon-si, KR;

Seok-jun Jang, Asan-si, KR;

Byung-uk Kim, Hwaseong-si, KR;

Sun-joo Park, Pyeongtaek-si, KR;

Suk-il Yoon, Suwon-si, KR;

Jong-hyun Jeong, Seoul, KR;

Soon-beom Hur, Anyang-si, KR;

Inventors:

Bong-Kyun Kim, Hwaseong-si, KR;

Shin-Il Choi, Hwaseong-si, KR;

Hong-Sick Park, Suwon-si, KR;

Wang-Woo Lee, Suwon-si, KR;

Seok-Jun Jang, Asan-si, KR;

Byung-Uk Kim, Hwaseong-si, KR;

Sun-Joo Park, Pyeongtaek-si, KR;

Suk-Il Yoon, Suwon-si, KR;

Jong-Hyun Jeong, Seoul, KR;

Soon-Beom Hur, Anyang-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/312 (2006.01);
U.S. Cl.
CPC ...
Abstract

A composition for removing a photoresist, the composition including about 1% by weight to about 10% by weight of tetramethyl ammonium hydroxide ('TMAH'), about 1% by weight to about 10% by weight of an alkanol amine, about 50% by weight to about 70% by weight of a glycol ether compound, about 0.01% by weight to about 1% by weight of a triazole compound, about 20% by weight to about 40% by weight of a polar solvent, and water, each based on a total weight of the composition.


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