The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Aug. 28, 2009
Kyung Joong Kim, Daejeon, KR;
Woo Lee, Daejeon, KR;
Yong Sung Kim, Daejeon, KR;
Young Heon Kim, Daejeon, KR;
Seung Hui Hong, Seoul, KR;
Wan Soo Yun, Daejeon, KR;
Sang Woo Kang, Daejeon, KR;
Kyung Joong Kim, Daejeon, KR;
Woo Lee, Daejeon, KR;
Yong Sung Kim, Daejeon, KR;
Young Heon Kim, Daejeon, KR;
Seung hui Hong, Seoul, KR;
Wan Soo Yun, Daejeon, KR;
Sang Woo Kang, Daejeon, KR;
Korea Research Institute of Standards and Science, Daejeon, KR;
Abstract
The present invention provides a semiconductor based photovoltaic device and a manufacturing method thereof. The semiconductor based photovoltaic device is able to absorb light with a wide band wavelength, and has high photoelectric conversion efficiency since it has high electron-hole pair separation efficiency. More specifically, the method for manufacturing the photovoltaic device comprises the steps of: a) forming a thin semiconductor quantum dot film on a p or n-type semiconductor substrate, wherein the thin semiconductor quantum dot film includes semiconductor quantum dots inside a medium at which the same type of impurities as the semiconductor substrate are doped; b) forming a pore array through partial etching, wherein the pore array penetrates the thin semiconductor quantum dot film; c) depositing a semiconductor in which complementary impurities to the semiconductor substrate are doped on the thin semiconductor quantum dot film at which the pore array is formed; and d) forming sequentially a transparent conductive film and an upper electrode on the semiconductor in which the complementary impurities are doped and forming a lower electrode at a lower portion of the semiconductor substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile