The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Aug. 02, 2011
Shinji Tarutani, Shizuoka, JP;
Hideaki Tsubaki, Shizuoka, JP;
Kazuyoshi Mizutani, Shizuoka, JP;
Kenji Wada, Shizuoka, JP;
Wataru Hoshino, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Hideaki Tsubaki, Shizuoka, JP;
Kazuyoshi Mizutani, Shizuoka, JP;
Kenji Wada, Shizuoka, JP;
Wataru Hoshino, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.