The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Feb. 10, 2006
Alex Gurary, Bridgewater, NJ (US);
Eric A. Armour, Pennington, NJ (US);
Richard Hoffman, Clinton, NJ (US);
Jonathan Cruel, Plano, TX (US);
Alex Gurary, Bridgewater, NJ (US);
Eric A. Armour, Pennington, NJ (US);
Richard Hoffman, Clinton, NJ (US);
Jonathan Cruel, Plano, TX (US);
Veeco Instruments Inc., Plainview, NY (US);
Abstract
A system and method for evenly heating a substrate placed in a wafer carrier used in wafer treatment systems such as chemical vapor deposition reactors, wherein a first pattern of wafer compartments is provided on the top of the wafer carrier, such as one or more rings of wafer carriers, and a second pattern of inlaid material dissimilar to the wafer carrier material is inlaid on the bottom of the wafer carrier, and the second pattern of inlaid material is substantially the opposite of the first pattern of wafer compartments, such that there are at least as many material interfaces in intermediate regions without wafer compartments as there are in wafer carrying regions with wafers and wafer compartments.