The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Feb. 01, 2011
Yefim P. Sukhman, Scottsdale, AZ (US);
Christian J. Risser, Scottsdale, AZ (US);
Nathan H. Schuknecht, Lake Forest Park, WA (US);
James W. Rabideau, Fountain Hills, AZ (US);
Joseph T. Hillman, Chandler, AZ (US);
Yefim P. Sukhman, Scottsdale, AZ (US);
Christian J. Risser, Scottsdale, AZ (US);
Nathan H. Schuknecht, Lake Forest Park, WA (US);
James W. Rabideau, Fountain Hills, AZ (US);
Joseph T. Hillman, Chandler, AZ (US);
Universal Laser Systems, Inc., Scottsdale, AZ (US);
Abstract
Embodiments of recirculating filtration and exhaust systems for material processing systems are disclosed herein. A material processing system configured in accordance with one embodiment includes an enclosure for processing a workpiece, the enclosure having an enclosure inlet and an enclosure outlet. The system also includes a first flow path fluidly coupled to the enclosure inlet and the enclosure outlet, and a first filtration assembly in the first flow path. The first filtration assembly draws airflow from the enclosure and returns the airflow to the enclosure. The system further includes a second flow path in fluid communication with the first flow path upstream from the enclosure inlet, and a second filtration assembly in the second flow path. The second filtration assembly draws airflow from the first flow path and returns airflow to the first flow path.