The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2013

Filed:

Aug. 18, 2010
Applicants:

Victor L. Pushparaj, Sunnyvale, CA (US);

Pravin K. Narwankar, Sunnyvale, CA (US);

Omkaram Nalamasu, San Jose, CA (US);

Inventors:

Victor L. Pushparaj, Sunnyvale, CA (US);

Pravin K. Narwankar, Sunnyvale, CA (US);

Omkaram Nalamasu, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/13 (2010.01); H01M 4/58 (2010.01); H01M 4/60 (2006.01); H01M 4/82 (2006.01); H01M 6/12 (2006.01); H01M 6/46 (2006.01); B05D 5/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and apparatus for forming energy storage devices are provided. In one embodiment a method of producing an energy storage device is provided. The method comprises positioning an anodic current collector into a processing region, depositing one or more three-dimensional electrodes separated by a finite distance on a surface of the anodic current collector such that portions of the surface of the anodic current collector remain exposed, depositing a conformal polymeric layer over the anodic current collector and the one or more three-dimensional electrodes using iCVD techniques comprising flowing a gaseous monomer into the processing region, flowing a gaseous initiator into the processing region through a heated filament to form a reactive gas mixture of the gaseous monomer and the gaseous initiator, wherein the heated filament is heated to a temperature between about 300° C. and about 600° C., and depositing a conformal layer of cathodic material over the conformal polymeric layer.


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