The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2013

Filed:

Jul. 18, 2012
Applicants:

Takeshi Fukuda, Osaka, JP;

Junji Hirose, Osaka, JP;

Kenji Nakamura, Osaka, JP;

Masato Doura, Osaka, JP;

Akinori Sato, Osaka, JP;

Inventors:

Takeshi Fukuda, Osaka, JP;

Junji Hirose, Osaka, JP;

Kenji Nakamura, Osaka, JP;

Masato Doura, Osaka, JP;

Akinori Sato, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm. The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.


Find Patent Forward Citations

Fukuda, Takeshi. (2013). Polishing pad and a method for manufacturing the same (U.S. Patent No. 8602846). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8602846

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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