The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Jul. 14, 2009
Kazuto Yamanaka, Sagamihara, JP;
Masahiro Shibamoto, Yokohama, JP;
Ayumu Miyoshi, Zama, JP;
Satoshi Hitomi, Fuchu, JP;
David Djulianto Djayaprawira, Inagi, JP;
Kazuto Yamanaka, Sagamihara, JP;
Masahiro Shibamoto, Yokohama, JP;
Ayumu Miyoshi, Zama, JP;
Satoshi Hitomi, Fuchu, JP;
David Djulianto Djayaprawira, Inagi, JP;
Canon Anelva Corporation, Kawasaki-shi, JP;
Abstract
The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate, and a first grid in the first ion beam generator, and a second grid in the second ion beam generator are configured so as to be asymmetrical to each other.