The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2013

Filed:

Sep. 29, 2011
Applicants:

Vladimir Bulovic, Lexington, MA (US);

Corinne Evelyn Packard, Sommerville, MA (US);

Jennifer Jong-hua Yu, Palo Alto, CA (US);

Apoorva Murarka, Cambridge, MA (US);

Leeann Kim, Somerville, MA (US);

Inventors:

Vladimir Bulovic, Lexington, MA (US);

Corinne Evelyn Packard, Sommerville, MA (US);

Jennifer Jong-Hua Yu, Palo Alto, CA (US);

Apoorva Murarka, Cambridge, MA (US);

LeeAnn Kim, Somerville, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01G 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The embodiments disclosed herein are directed to fabrication methods useful for creating MEMS via microcontact printing by using small organic molecule release layers. The disclose method enables transfer of a continuous metal film onto a discontinuous platform to form a variable capacitor array. The variable capacitor array can produce mechanical motion under the application of a voltage. The methods disclosed herein eliminate masking and other traditional MEMS fabrication methodology. The methods disclosed herein can be used to form a substantially transparent MEMS having a PDMS layer interposed between an electrode and a graphene diaphragm.


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