The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2013

Filed:

Mar. 15, 2011
Applicants:

Antonio Facchetti, Chicago, IL (US);

Tobin J. Marks, Evanston, IL (US);

Hui Huang, Evanston, IL (US);

Zhihua Chen, Skokie, IL (US);

Inventors:

Antonio Facchetti, Chicago, IL (US);

Tobin J. Marks, Evanston, IL (US);

Hui Huang, Evanston, IL (US);

Zhihua Chen, Skokie, IL (US);

Assignees:

Northwestern University, Evanston, IL (US);

Polyera Corporation, Skokie, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 75/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are conjugated polymers having desirable properties as semiconducting materials. Such polymers can exhibit desirable electronic properties and possess processing advantages including solution-processability and/or good stability.


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