Adamantane derivative, method for producing same, polymer using same as starting material, and resin composition

Abstract

Provided are an adamantane derivative represented by the following formula (1), a method for producing the same, a polymer containing an acrylate compound having the adamantane structure represented by formula (1) in a repeat unit, and a functional resin composition which contains the polymer, has excellent alkali developability and substrate adhesiveness, and can improve the resolution and the line edge roughness as a chemically amplified resist sensitive to far-ultraviolet rays represented by KrF excimer laser light, ArF excimer laser light, Fexcimer laser light or EUV without spoiling fundamental properties thereof as a resist such as pattern forming properties, dry etching resistance, heat resistance and the like. In the formula, Rthrough R, which may be the same or different, each represent a hydrogen atom, an alkyl group having a carbon number of 1 to 3, or a halogen-containing alkyl group; Rthrough R, which may be the same or different, each represent an alkyl group having a carbon number of 1 to 3 or a halogen-containing alkyl group; X, which may be the same or different, represents a hydrogen atom, an alkyl group having a carbon number of 1 to 3, or a alkoxy group having a carbon number of 1 to 3; and n represents 14.