The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Jun. 22, 2010
Ali Afzali-azdakani, Ossining, NY (US);
Shafaat Ahmed, Yorktown Heights, NY (US);
Hariklia Deligianni, Tenafly, NJ (US);
Dario L. Goldfarb, Dobbs Ferry, NY (US);
Stefan Harrer, New York, NY (US);
Hongbo Peng, Yorktown Heights, NY (US);
Stanislav Polonsky, Putnam Valley, NY (US);
Stephen Rossnagel, Pleasantville, NY (US);
Xiaoyan Shao, Yorktown Heights, NY (US);
Gustavo A. Stolovitzky, Riverdale, NY (US);
Ali Afzali-Azdakani, Ossining, NY (US);
Shafaat Ahmed, Yorktown Heights, NY (US);
Hariklia Deligianni, Tenafly, NJ (US);
Dario L. Goldfarb, Dobbs Ferry, NY (US);
Stefan Harrer, New York, NY (US);
Hongbo Peng, Yorktown Heights, NY (US);
Stanislav Polonsky, Putnam Valley, NY (US);
Stephen Rossnagel, Pleasantville, NY (US);
Xiaoyan Shao, Yorktown Heights, NY (US);
Gustavo A. Stolovitzky, Riverdale, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention provides a method of forming an electrode having reduced corrosion and water decomposition on a surface thereof. A conductive layer is deposited on a substrate. The conductive layer is partially oxidized by an oxygen plasma process to convert a portion thereof to an oxide layer thereby forming the electrode. The oxide layer is free of surface defects and the thickness of the oxide layer is from about 0.09 nm to about 10 nm and ranges therebetween, controllable with 0.2 nm precision.