The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Nov. 15, 2010
Johannes N. Stahl, Walnut Creek, CA (US);
Himanshu P. Shukla, Lafayette, CA (US);
Johannes N. Stahl, Walnut Creek, CA (US);
Himanshu P. Shukla, Lafayette, CA (US);
Siemens Medical Solutions USA, Inc., Malvern, PA (US);
Abstract
Aspects may include movement of at least one device along a path to change an orientation of a target volume with respect to a radiation beam emitter, determination that the at least one device has reached a start position of a first path section associated with a first radiation treatment beam, emission, while the at least one device moves along the first path section, of the first radiation treatment beam from the radiation beam emitter toward a target volume, determination that the at least one device has reached a stop position of the first path section, ceasing emission of the first radiation treatment from the radiation beam emitter in response to the determination that the at least one device has reached a stop position of the first path section, determination that the at least one device has reached a start position of a second path section associated with a second radiation treatment beam, the start position of the second path section being different from the stop position of the first path section, and emission, while the at least one device moves along the second path section, of the second radiation treatment beam from the radiation beam emitter toward the target volume.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile