The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Nov. 09, 2011
Tsutomu Ogihara, Jyoetsu, JP;
Daisuke Kori, Jyoetsu, JP;
Yusuke Biyajima, Jyoetsu, JP;
Takeru Watanabe, Jyoetsu, JP;
Toshihiko Fujii, Jyoetsu, JP;
Takeshi Kinsho, Jyoetsu, JP;
Tsutomu Ogihara, Jyoetsu, JP;
Daisuke Kori, Jyoetsu, JP;
Yusuke Biyajima, Jyoetsu, JP;
Takeru Watanabe, Jyoetsu, JP;
Toshihiko Fujii, Jyoetsu, JP;
Takeshi Kinsho, Jyoetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formula (1-1) and/or general formula (1-2), and one or more kinds of compounds and/or equivalent bodies thereof represented by the following general formula (2). There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.