The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2013

Filed:

Dec. 21, 2011
Applicants:

Daina Inoue, Yokkaichi, JP;

Hidenobu Nagashima, Yokkaichi, JP;

Akira Yotsumoto, Yokkaichi, JP;

Inventors:

Daina Inoue, Yokkaichi, JP;

Hidenobu Nagashima, Yokkaichi, JP;

Akira Yotsumoto, Yokkaichi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor storage device includes an interlayer insulating film provided between select gate electrodes, a first fill material extending along upper portions of memory cell gate electrodes so as to cover air gaps residing between the memory cell gate electrodes, the first fill material extending along sidewalls of the select gate electrodes and sidewalls of the interlayer insulating film so as to define a recess above the first fill material extending along the sidewalls of the select gate electrodes and the sidewalls of the interlayer insulating film, a second fill material filling the recess above the first fill material, and a plurality of contacts formed through the interlayer insulating film, the contacts physically contacting each of device areas formed in a semiconductor substrate.


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