The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Nov. 27, 2007
Byung Soo Eun, Seoul, KR;
Byung Soo Eun, Seoul, KR;
SK hynix Inc., Icheon-Si, KR;
Abstract
In a method for fabricating an inter dielectric layer in semiconductor device, a primary liner HDP oxide layer is formed by supplying a high density plasma (HDP) deposition source to a bit line stack formed on a semiconductor substrate. A high density plasma (HDP) deposition source is supplied to the bit line stack to form a primary liner HDP oxide layer. The primary liner HDP oxide layer is etched to a predetermined depth to form a secondary liner HDP oxide layer. An interlayer dielectric layer is formed to fill the areas defined by the bit line stack where the secondary liner HDP oxide layer is located.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile