The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Nov. 16, 2006
Han-chung Lai, Hsin-Chu, TW;
Han-Chung Lai, Hsin-Chu, TW;
AU Optronics Corporation, Hsinchu, TW;
Abstract
A method is used to prevent unwanted electrical contacts between various electrically conducting surfaces and lines in a display panel due to an n+ a-Si residue and/or ITO debris. The method provides a clearing pattern including at least a cleared area in the passivation layer for preventing the residue or debris from locating at the cleared area. As such, if an n+ a-Si residue happens to be deposited under the passivation layer, the part of the residue located in the cleared area is removed by an a-Si selective etching process, for example. Furthermore, with the cleared area, ITO debris deposited on the section of the dielectric layer deposited on the signal line can be electrically isolated from the electrode.