The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Dec. 01, 2008
Dai Oguro, Hiratsuka, JP;
Go Higashihara, Hiratsuka, JP;
Seiji Kita, Kurashiki, JP;
Mitsuharu Kitamura, Kurashiki, JP;
Masashi Ogiwara, Kurashiki, JP;
Dai Oguro, Hiratsuka, JP;
Go Higashihara, Hiratsuka, JP;
Seiji Kita, Kurashiki, JP;
Mitsuharu Kitamura, Kurashiki, JP;
Masashi Ogiwara, Kurashiki, JP;
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Abstract
A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.