The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Sep. 02, 2011
Applicants:
Yun-suk Nam, Yongin-si, KR;
Si-young Choi, Seongnam-si, KR;
Yong-kug Bae, Hwaseong-si, KR;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
Abstract
A mask for forming patterns of a semiconductor device is provided. The mask includes first and second main patterns disposed to be spaced apart from each other about a cross point and extending in first and second directions different from each other, a third main pattern disposed spaced apart from the first and second main patterns while being disposed between the first and second main patterns so as to overlap the cross point, and at least one auxiliary pattern spaced apart from the third main pattern in the periphery of a portion of the third main pattern, which is not adjacent with the first and second main patterns.