The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Sep. 13, 2010
Tatsuya Fujinami, Kanagawa, JP;
Shinsuke Takahashi, Kanagawa, JP;
Jun Fujinawa, Kanagawa, JP;
Kouji Tonohara, Kanagawa, JP;
Tatsuya Fujinami, Kanagawa, JP;
Shinsuke Takahashi, Kanagawa, JP;
Jun Fujinawa, Kanagawa, JP;
Kouji Tonohara, Kanagawa, JP;
Fujifilm Corporation, Tokyo, JP;
Abstract
A film deposition method deposits a film on a surface of a substrate in strip form traveling on a peripheral surface of a cylindrical drum in at least one film deposition compartment around the peripheral surface of the drum. The method disposes previously a differential compartment between one film deposition compartment and a compartment including a wrapping space containing at least one of a first position at which the substrate starts to travel on the drum and a second position at which the substrate separates from the drum, the differential compartments communicating with the compartment including the wrapping space and the film deposition compartment, sets a first pressure of the wrapping space lower than a second pressure of the at least one film deposition compartment and performs film deposition in the film deposition compartment with electric power supplied to the drum.