The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Sep. 06, 2012
Michael A. Cobb, Croton on Hudson, NY (US);
Mahadevaiyer Krishnan, Hopewell Junction, NY (US);
Michael F. Lofaro, Hopewell Junction, NY (US);
Dennis G. Manzer, Beford Hills, NY (US);
Michael A. Cobb, Croton on Hudson, NY (US);
Mahadevaiyer Krishnan, Hopewell Junction, NY (US);
Michael F. Lofaro, Hopewell Junction, NY (US);
Dennis G. Manzer, Beford Hills, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An apparatus for chemical mechanical planarization includes a spindle assembly structure and at least one substrate carrier, which make a linear lateral movement relative to each other while abrasive surfaces of a plurality of cylindrical spindles in the spindle assembly structure contact, and rotate against, at least one substrate mounted on the at least one substrate carrier. The direction of the linear lateral movement is within the plane that tangentially contacts the plurality of cylindrical spindles, and can be orthogonal to the axes of rotation of the plurality of cylindrical spindles.